RF Generator
A core device that delivers high-frequency power to process chambers for plasma generation.
Essential component for semiconductor processes such as etching and deposition.
ASENDIA RF Generators offer precise power control with the latest RF power technologies ranging
from 370kHz to 100MHz and power from 500W to 5kW, all satisfying configuration, control, and application
requirements. ASENDIA RF Generators are used in CVD, ALD, etching, cleaning, and many more.
ASENDIA provides access to a variety of products in two major line-ups; Premium line & Budget-friendly line.
Premium generators offer the best performance with numerous functions, while Budget-friendly
generators are cost-effective products that contain only the key main functions.
Features
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Continuous and
pulsed RF output -
Multi-level pulse
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VF function
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EtherCAT interface
-
Arc handling
Specifications
| AGL Series | APG Series | MP Series | |
| Types | Half-Rack, Full-Rack | ||
| Frequency Range | 350kHz - 100MHz | ||
| Max Power Range | 500W - 5kW | ||
| Interface | Standard: RS-232, RS-422(RS-485), Analog / Optional : DeviceNET, Ethernet, EtherCAT | ||
| Pulsing Capability | 50Hz ~ 50kHz(5kHz) | ||
| Pulsing Duty | 10% - 90% | ||
| Arc Management | Available (Arc Count monitoring, Arc Handing Function, Arc Alarm Function) | ||
| Multi-Level Pulsing | Pulse Waveform Control | ||
| Frequency Turning | Available (Center Frequency ±5%) | ||
| Fast Control | RF On/Off time < 1msec | ||
| Initial Power Function | Faster plasma transitions | ||