RF Generator
프로세스 챔버에 고주파 전력을 공급하여 플라즈마를 형성하기 위한 장치
플라즈마를 사용하는 반도체 공정(식각, 증착 등)에 사용되는 핵심 부품
Features
-
Continuous and
pulsed RF output -
Multi-level pulse
-
VF function
-
EtherCAT interface
-
Arc handling
Specifications
| AGL Series | APG Series | MP Series | |
| Types | Half-Rack, Full-Rack | ||
| Frequency Range | 350kHz - 100MHz | ||
| Max Power Range | 500W - 5kW | ||
| Interface | Standard: RS-232, RS-422(RS-485), Analog / Optional : DeviceNET, Ethernet, EtherCAT | ||
| Pulsing Capability | 50Hz ~ 50kHz(5kHz) | ||
| Pulsing Duty | 10% - 90% | ||
| Arc Management | Available (Arc Count monitoring, Arc Handing Function, Arc Alarm Function) | ||
| Multi-Level Pulsing | Pulse Waveform Control | ||
| Frequency Turning | Available (Center Frequency ±5%) | ||
| Fast Control | RF On/Off time < 1msec | ||
| Initial Power Function | Faster plasma transitions | ||